Effects of the Ethyne Flow Ratio on Structures and Mechanical Properties of Reactive High Power Impulse Magnetron Sputtering Deposited Chromium-Carbon Films

Chromium-carbon films were deposited by utilizing reactive high-power impulse magnetron sputtering with different mixture ratios of ethyne and argon a constant deposition total pressure while the temperature, pulse frequency, duty cycle average power chromium cathode remain same. The microstructure chemical bonding obtained within composition compared. results show that increasing ratio, carbon content in increases linearly two slopes. Moreover, film changes from dense glassy structure into columnar structure, even clusters structure. sp2-C decreases but Cr–C decreasing ratio. This reveals main phase hydrogenated amorphous carbide phase. Such cause large difference on hardness elasticity.